Photo-Etching, electrocasting and punching for thin plate by Meltec

Etching of thin layer metal

HOME>Thin film etching
Chemical etching to form patterns on vapor-deposited thin layer metal of various base mateial.

Etching to thin film material which is spattered and evaporated by ITO/Al/Zinic Sulfide/Ni etc . has achived high precesion pattern.

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Technology highlights

-Veriety of base materials can be processed : from plastic such as polycarbonate/PET/acrylic to glass and metals.

-Thin layer metal:Ai, Ni, Cu, Cr, Zn, Ti, Si, Nb, Mo, W, S and etc.

- Base material: glass/ceramic/glass epoxy/PI/PC/PMMA/PET/metal and etc.

-Outside processing of base material: outside shape by stamping, cutting etc. can be done with positional accuracy.


Polycarbonate disk is made by thin layer metal etching technology.


Technology highlights

  • Lower cost than glass scale
  • Crashproof and splinterless
  • Fine and high precision
  • High heat-resistance(120 degreesCelsius)
  • Both transparent and reflective types are available.
  • Non-penetration bar code made of alminium is formed.

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